Sensitivity of shuttle vector plasmid pZ189 DNA to carbon ion beams.

  • Authors:
    • K Harada
    • T Ueda
    • M Ando
    • S Sawada
    • H Yamanaka
    • Y Tamura
    • H Watanabe
    • S Nagaoka
    • T Nakano
    • C Mukai
    • T Ohnishi
  • View Affiliations

  • Published online on: November 1, 1999     https://doi.org/10.3892/ijmm.4.5.509
  • Pages: 509-520
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Abstract

The sensitivity of shuttle vector plasmid pZ189 DNA to carbon ion beams was studied under dry conditions. This plasmid contains the supF gene that can be used in mutagenesis analysis. The survival curve of the plasmid had both a shoulder and exponential parts, and showed a D10 value of about 17 kGy for both Escherichia coli wild-type and DNA repair-deficient mutant (UV-sensitive) strains. Therefore, it was assumed that the excision repair system was not effective for repairing DNA lesions induced by irradiation with carbon ion beams.

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Nov 1999
Volume 4 Issue 5

Print ISSN: 1107-3756
Online ISSN:1791-244X

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Spandidos Publications style
Harada K, Ueda T, Ando M, Sawada S, Yamanaka H, Tamura Y, Watanabe H, Nagaoka S, Nakano T, Mukai C, Mukai C, et al: Sensitivity of shuttle vector plasmid pZ189 DNA to carbon ion beams.. Int J Mol Med 4: 509-520, 1999.
APA
Harada, K., Ueda, T., Ando, M., Sawada, S., Yamanaka, H., Tamura, Y. ... Ohnishi, T. (1999). Sensitivity of shuttle vector plasmid pZ189 DNA to carbon ion beams.. International Journal of Molecular Medicine, 4, 509-520. https://doi.org/10.3892/ijmm.4.5.509
MLA
Harada, K., Ueda, T., Ando, M., Sawada, S., Yamanaka, H., Tamura, Y., Watanabe, H., Nagaoka, S., Nakano, T., Mukai, C., Ohnishi, T."Sensitivity of shuttle vector plasmid pZ189 DNA to carbon ion beams.". International Journal of Molecular Medicine 4.5 (1999): 509-520.
Chicago
Harada, K., Ueda, T., Ando, M., Sawada, S., Yamanaka, H., Tamura, Y., Watanabe, H., Nagaoka, S., Nakano, T., Mukai, C., Ohnishi, T."Sensitivity of shuttle vector plasmid pZ189 DNA to carbon ion beams.". International Journal of Molecular Medicine 4, no. 5 (1999): 509-520. https://doi.org/10.3892/ijmm.4.5.509